Nickel Plate Etching

Shenzhen JETCH Technology Co., Ltd. has over 20 years of expertise in high-end precision metal etching and independent R&D capabilities. Serving renowned enterprises in the hydrogen energy sector, we hold ISO9001 quality system certification and IATF16949 certification. To enhance customer service, we have established a new platinum plating production line, offering one-stop bipolar plate procurement services. We provide customized solutions for metal bipolar plate etching processes, including technical valuation, sample prototyping, rapid validation, and mass production delivery. Our product consistency and delivery capabilities have been rigorously verified. We are also planning a highly automated factory and welcome visits.

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Process Advantages of

A four-step sequence—alkaline degrease, acid activation, DI-water rinse, and hot-air drying—completely removes oxides and organic contaminants from the nickel surface.

Ultra-Clean Pretreatment

Delivers an atomically clean, high-surface-energy substrate that boosts photoresist adhesion by ≥30 % and virtually eliminates resist lifting defects.

High-Precision Lithographic Pattern Transfer

Achieves ≤5 µm channel-to-channel registration error and sub-micron sidewall definition, enabling tight bipolar-plate dimensional tolerances of ±0.05 mm.

Controlled Wet-Etch Channel Forming

Delivers uniform channel depth (±3 %) while minimizing under-cut, giving smooth sidewalls (Ra ≤1.6 µm) without costly dry-etch hardware.

Versatile Post-Etch Surface Engineering

Restores pristine metal finish and allows on-the-fly upgrade of corrosion resistance & interfacial conductivity (<1 mΩ·cm² contact resistance) for PEMFC or AEM electrolyzer duty.

Etching Process Flow for Nickel Bipolar Plates

Pre-treatment

The core objective of this stage is to prepare a nickel plate surface that is thoroughly clean, free of oxide films and contaminants, and has enhanced surface activity.

Photoresist Coating

A uniform, defect-free photoresist film (sensitive to specific wavelengths of light, typically ultraviolet (UV)) is applied to the pre-treated clean nickel surface, serving as a "protective mask" for the subsequent pattern transfer.

Exposure

The nickel plate coated with photoresist is aligned with a photomask (chrome mask) that carries the pre-designed bipolar plate flow channel pattern.

Development

The exposed nickel plate is immersed in a dedicated developer (for negative photoresists

Etching

The nickel plate with the developed photoresist pattern is placed in an etching solution

Stripping Post-treatment and Quality Inspection

This stage ensures the nickel bipolar plate meets the performance and reliability requirements for use in fuel cells or AEM electrolyzers.

JETCH ETCHING APPLICATIONS

Hydrogen Production

Automotive

Medical

Microchannels

Hydrogen Fuel Cells

Communications

Optical Equipment

3C Products

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