Titanium Plate Etching

Shenzhen JETCH Technology Co., Ltd. has over 20 years of expertise in high-end precision metal etching and independent R&D capabilities. Serving renowned enterprises in the hydrogen energy sector, we hold ISO9001 quality system certification and IATF16949 certification. To enhance customer service, we have established a new platinum plating production line, offering one-stop bipolar plate procurement services. We provide customized solutions for metal bipolar plate etching processes, including technical valuation, sample prototyping, rapid validation, and mass production delivery. Our product consistency and delivery capabilities have been rigorously verified. We are also planning a highly automated factory and welcome visits.

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Process Advantages of

Hot-roll lamination (90–110 °C, 0.3–0.5 MPa) of negative-tone dry film, UV exposure through chrome mask (alignment ≤ ±5 µm) and mild-alkali development.

De-Passivation & Ultra-Clean Pre-Treatment

Guarantees >95 % photoresist adhesion yield and eliminates local “white spots,” enabling defect-free pattern transfer even on large-format sheets.

Precision Dry-Film Lithography

Achieves ≤5 µm channel-to-channel registration error and vertical sidewalls (etch factor ≥ 4:1) without the thickness non-uniformity typical of liquid resists.

Fluoride-Based Controlled Etch

Delivers uniform channel depth (±3 %) and surface roughness Ra ≤ 1.2 µm in 3–8 min, minimizing lateral under-cut and eliminating post-etch pitting.

Clean Strip & Functional Surface Finish

Restores mirror-like surface, cuts interfacial contact resistance to <1 mΩ·cm² and boosts corrosion resistance in aggressive PEM/AEM media, extending bipolar-plate lifetime >2×.

Full Process of Titanium Bipolar Plate Etching Technology

Pre-treatment

The purpose of this stage is to obtain an absolutely clean, oxide-free, and activated titanium plate surface, ensuring the adhesion of the photoresist and the uniformity of etching.

Photoresist Coating

A thin film of photoresist, which is sensitive to specific light, is evenly applied to the clean surface of the titanium plate.

Exposure

A pre-designed bipolar plate flow channel pattern (usually a black-and-white chrome mask) is placed over the titanium plate coated with photoresist, and ultraviolet (UV) light is used for irradiation.

Development

A specific developer (usually a weakly alkaline solution, such as sodium carbonate solution) is used to dissolve the unexposed (for negative photoresist) or exposed (for positive photoresist) photoresist areas, thereby accurately transferring the flow channel pattern onto the photoresist layer.

Etching

This is the core step. The developed titanium plate is immersed in an etching solution, and the titanium metal parts not protected by the photoresist are dissolved and removed through a chemical reaction to form flow channels.

Stripping Post-treatment & Cleaning

Thorough Cleaning, Drying, Inspection, Optional Step - Surface Modification

JETCH ETCHING APPLICATIONS

Hydrogen Production

Automotive

Medical

Microchannels

Hydrogen Fuel Cells

Communications

Optical Equipment

3C Products

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